Open Access

A Comprehensive Review on Zinc Sulphide Thin Film by Chemical Bath Deposition Techniques

T. Shobana, Department of Physics, St. Joseph’s College for Women, Tiruppur, TN, India. T. Venkatesan, Deparment of Physics, Chikkanna Government Arts College, Tiruppur, TN, India. D. Kathirvel kathirvelde@gmail.com
Department of Physics, Government Arts College, Coimbatore, TN, India.


J. Environ. Nanotechnol., Volume 9, No 1 (2020) pp. 50-59

https://doi.org/10.13074/jent.2020.03.201394

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Abstract

Nowadays, the synthesis of metal chalcogenides has received wide attention because of their suitability, simplicity and cost-effectiveness for large scale deposition by the selection of suitable chemical methods. Predominantly, thin-film technology has led to large-scale deposition techniques, using the variety of substrates such as insulators, semiconductors and metals. These methods are applicable at low temperatures, reducing the chances of oxidation and corrosion of the substrate. Among the various methods, Chemical Bath Deposition is highly attractive, owing to its advantages over conventional thin film deposition method. Moreover, it does not require high temperature as well as sophisticated and expensive equipment.  Most researchers focused on the metal sulphides; they have a wide range of applications like sensors, modulators, dielectric filters, LEDs, efficient phosphors in flat panel display and buffer layers in the solar cells. A comprehensive review has been attempted in this work with necessary background theory for the thin film depositions. The Chemical Bath Deposition method has been reviewed in detail to obtain well-adherent and uniform zinc sulphide thin films. Bath parameters and structural, morphological, optical, and electrical properties were highlighted.

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Reference


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