Open Access

Front Nanogratings Decorated Ultrathin Film Amorphous Si Solar Cell Performances

R. S. Dubey, School of Computer Science & Artificial Intelligence, SR University, Hanumakonda District, Warangal, TG, India Ch. Rajyalakshmi, Department of Basic Science, Vishnu Institute of Technology, Bhimavaram, AP, India J. Mounika Naga Ramya, Department of Science & Humanities, Bonam Venkata Chalamayya Engineering College, Odalarevu, AP, India S. Saravanan, shasa86@gmail.com
Department of Science & Humanities, Swarnandhra College of Engineering & Technology (A), Narsapur, West Godavari, AP, India K. Padma Pavani, Department of Basic Science, Vishnu Institute of Technology, Bhimavaram, AP, India G. V. S. S. Sarma Department of Applied Science and Humanities, M.V.S.R. Engineering College, Balapur, Hyderabad, TG, India

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Abstract

Solar cells provide a renewable, clean energy source, reducing reliance on fossil fuels and minimizing environmental impact. They offer economic savings, energy independence, and flexibility for various applications. In this work, the nanophotonic and nanoplasmonic grating structures are integrated in the front side of the active (amorphous Si) layer. The transverse electric and transverse magnetic field distributions were demonstrated by varying the incident wavelengths at a normal incidence angle. Furthermore, improved current densities of distinct ultrathin amorphous Si (a-Si) solar cells decorated with nanogratings (SiO2, Ag, and Si3N4) were explored. The obtained results indicated that the optimized SiO2 nanogratings and Si3N4 film acted as anti-reflection coating (ARC) layers with air medium (AM 1.5) and showed a remarkable current density of 16.25 mA/cm2 in ultrathin a-Si solar cells with a thickness of 180 nm.

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Reference

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