TY - JOUR
TI - Development of Lift-off Process using Plasma-enhanced Chemical Vapor Deposition Silicon Dioxide
AU - Yatish Prasad
AU - Chiranjeevi Lakavath
AU - H. M. Raghvendra
AU - Selvaraj
AU - B. Bhattacharyya      
AU -  P. Sathish Kumar
PY - 2020
DO - 10.13074/jent.2020.06.202406
T2 - Journal of Environmental Nanotechnology
JF - Journal of Environmental Nanotechnology
JA - J. Environ. Nanotechnol.
SP - 04
EP - 07
VL - 9
IS - 2
PB - Institute for Environmental Nanotechnology
ER -